[PDF.23st] Ultraclean Surface Processing of Silicon Wafers: Secrets of VLSI Manufacturing

Ultraclean Surface Processing of Silicon Wafers: Secrets of VLSI Manufacturing

[PDF.ez73] Ultraclean Surface Processing of Silicon Wafers: Secrets of VLSI Manufacturing

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 | #4677692 in Books |  1998-10-30 | Original language:English | PDF # 1 |  9.02 x1.56 x5.98l,2.46 | File type: PDF | 616 pages

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||From the Back Cover|The contamination of wafer surfaces with particles arising from the processing equipment is the main reason for yield losses in the manufacturing of VLSI devices. The starting point for the control of contamination must be the surface of the

A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor ...

You easily download any file type for your gadget.Ultraclean Surface Processing of Silicon Wafers: Secrets of VLSI Manufacturing   |  From Springer.Not only was the story interesting, engaging and relatable, it also teaches lessons.

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