[PDF.83of] Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications (Springer Series in Electronics and Photonics)
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Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications (Springer Series in Electronics and Photonics)
Takashi Hori
[PDF.br41] Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications (Springer Series in Electronics and Photonics)
Gate Dielectrics and MOS Takashi Hori epub Gate Dielectrics and MOS Takashi Hori pdf download Gate Dielectrics and MOS Takashi Hori pdf file Gate Dielectrics and MOS Takashi Hori audiobook Gate Dielectrics and MOS Takashi Hori book review Gate Dielectrics and MOS Takashi Hori summary
| #4947270 in Books | 1997-11-26 | Original language:English | PDF # 1 | .82 x6.36 x9.52l,1.40 | File type: PDF | 352 pages||1 of 1 people found the following review helpful.| Outstanding|By K. A. Shaw|A truly excellent summary of dielectric properties of SiO2 and nitrided oxides. The dielectric breakdown chapter is detailed, clear, and well thought-out. The references are useful and cover the literature well. Highly recommended. Kevin A. Shaw, Ph.D.|2 of 2 people found the following review helpful.| Excellent fo|From the Back Cover|Gate Dielectrics and MOS ULSIs provides necessary and sufficient information for those who wish to know well and go beyond the conventional SiO2 gate dielectric. The topics particularly focus on dielectric films satisfying the superior
Gate Dielectrics focusses on dielectric films satisfying the superior quality gate dielectric even in large-scale integration. The information presented is rather up to date with regard to nanometer-range ultrathin gate-dielectric films, which are indispensible for submicrometer ULSIs.
You can specify the type of files you want, for your gadget.Gate Dielectrics and MOS ULSIs: Principles, Technologies and Applications (Springer Series in Electronics and Photonics) | Takashi Hori. A good, fresh read, highly recommended.