[PDF.71mc] Diazonaphthoquinone-based Resists (Tutorial Texts in Optical Engineering)
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Diazonaphthoquinone-based Resists (Tutorial Texts in Optical Engineering)
Ralph Dammel
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| #2936850 in Books | SPIE Publications | 1993-02-15 | Original language:English | PDF # 1 | 10.25 x7.25 x.50l,1.03 | File type: PDF | 203 pages | ||0 of 0 people found the following review helpful.| I bought this not-so-easy to find book, and it ...|By Andrei K. Dioumaev|I bought this not-so-easy to find book, and it arrived exactly as promised ... BTW very cheaply!
This book elucidates the reasons underlying the lasting success of DNQ/N resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The basic chemistries of both DNQ sensitizers and novolak resins are explored. Focus also is placed on the chemical basis of application-related facets of the lithographic process. Methods of increasing process performance, such as image reversal, top layer imaging, antirefle...
You can specify the type of files you want, for your gadget.Diazonaphthoquinone-based Resists (Tutorial Texts in Optical Engineering) | Ralph Dammel. A good, fresh read, highly recommended.