[PDF.16ka] Advances in Rapid Thermal and Integrated Processing (Nato Science Series E:)

Advances in Rapid Thermal and Integrated Processing (Nato Science Series E:)

[PDF.lw75] Advances in Rapid Thermal and Integrated Processing (Nato Science Series E:)

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 | #9186657 in Books |  2010-12-03 | Original language:English | PDF # 1 |  9.25 x1.31 x6.10l,1.77 | File type: PDF | 566 pages

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Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of rea...

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